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材料导报  2023, Vol. 37 Issue (16): 22030222-6    https://doi.org/10.11896/cldb.22030222
  金属与金属基复合材料 |
壳聚糖在铝低压力化学机械抛光中的钝化作用及抛光行为研究
任荣浩, 孙平, 王永光*, 丁钊, 赵栋, 俞泽新
苏州大学机电工程学院,江苏 苏州 215006
Passivation and Polishing Behavior of Chitosan in Low Pressure Chemical Mechanical Polishing of Aluminum
REN Ronghao, SUN Ping, WANG Yongguang*, DING Zhao, ZHAO Dong, YU Zexin
School of Mechanical and Electric Engineering, Soochow University, Suzhou 215006,Jiangsu, China
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摘要 为了满足铝等软金属低压力的抛光要求,往往采用引入钝化剂的方式增强抛光液的缓释性,从而提高抛光质量。但是传统的强钝化剂存在价格高、缓蚀效果过强、污染环境等问题。采用羧甲基壳聚糖(CMCS)代替传统的强钝化剂以达到弱缓蚀与低压力抛光的平衡作用。通过静态腐蚀、化学机械抛光(CMP)实验,研究了CMCS对铝片在弱碱性条件下的抛光效果的影响规律;通过Zeta电势及粒径分析研究了CMCS对抛光液硅溶胶稳定性的影响。实验结果表明,CMCS的加入可以有效降低铝片表面受到的化学腐蚀作用;同时质量分数为0.05%的CMCS还可以提高硅溶胶的分散性,防止磨料聚集对铝片表面造成侵蚀性划伤。采用XPS、电化学等实验表征手段研究了CMCS对铝片表面的缓蚀效果,验证了CMCS在铝片表面可以形成纳米吸附层起到界面型缓蚀剂的作用。
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任荣浩
孙平
王永光
丁钊
赵栋
俞泽新
关键词:    化学机械抛光  钝化作用  羧甲基壳聚糖(CMCS)  缓蚀机制  低压力    
Abstract: In order to meet the low-pressure polishing requirements of soft metals such as aluminum, passivator is often introduced to enhance the slow release of polishing fluid and improve the polishing quality. However, the traditional strong passivator has some problems, such as high price, strong corrosion inhibition effect and environmental pollution. In this paper, carboxymethyl chitosan (CMCS) was used instead of traditional strong passivating agent to achieve a balance between weak corrosion inhibition and low-pressure polishing. The effect of CMCS on the polishing effect of aluminum under weak alkaline conditions was studied by static etching and chemical mechanical polishing (CMP) experiments. The effect of CMCS on the stability of silicon sol was studied by Zeta potential and particle size analysis. The experimental results show that the addition of CMCS can effectively reduce the chemical corrosion on the aluminum surface. At the same time, the 0.05% CMCS can also improve the dispersion of silica sol and prevent the erosion of aluminum surface caused by abrasive aggregation. XPS, electrochemistry and other experimental characterization methods were used to study the corrosion inhibition effect of CMCS on the surface of aluminum sheet, and it was verified that CMCS can form nano adsorption layer on the surface of aluminum sheet and play the role of interfacial corrosion inhibitor.
Key words:  aluminum    chemical mechanical polishing    inactivation    carboxymethyl chitosan (CMCS)    corrosion mitigation mechanism    low-pressure
出版日期:  2023-08-25      发布日期:  2023-08-14
ZTFLH:  TG580.692  
基金资助: 国家自然科学基金(51775360)
通讯作者:  *王永光,苏州大学机电工程学院教授、博士研究生导师。2004年江南大学包装工程专业本科毕业,2008年江南大学轻工技术与工程专业博士毕业。目前主要从事超精密加工、摩擦学与表面工程等方面的研究工作。发表论文70余篇,包括Applied Surface Science、Tribology International、Wear、《科学通报》《中国科学》等。wangyg@suda.edu.cn   
作者简介:  任荣浩,2020年6月于鲁东大学获得工学学士学位。现为苏州大学机电工程学院硕士研究生,在王永光教授的指导下进行研究。目前主要研究领域为超精密抛光。
引用本文:    
任荣浩, 孙平, 王永光, 丁钊, 赵栋, 俞泽新. 壳聚糖在铝低压力化学机械抛光中的钝化作用及抛光行为研究[J]. 材料导报, 2023, 37(16): 22030222-6.
REN Ronghao, SUN Ping, WANG Yongguang, DING Zhao, ZHAO Dong, YU Zexin. Passivation and Polishing Behavior of Chitosan in Low Pressure Chemical Mechanical Polishing of Aluminum. Materials Reports, 2023, 37(16): 22030222-6.
链接本文:  
http://www.mater-rep.com/CN/10.11896/cldb.22030222  或          http://www.mater-rep.com/CN/Y2023/V37/I16/22030222
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