Abstract: High purity boron is an important material for high-tech and electronic information. It is an important strategic material indispensable for military and high-tech. In this paper, hydrogen and boron halide, boron halide, borane respectively on the surface of metal substrate, boron rod substrate and chemical vapor deposition by fluidized bed technique to prepare boron powder were expounded. The advantages and disadvantages of each method were analyzed and compared. High-yield and high purity boron powder by using borane and introducing fluidized bed technology was prepared. The method of recovery of by-products was discussed, and a method of combing of fluidized bed with chemical vapor deposition (FB-CVD) to produce economic, industrial high purity boron powder was further proposed.
曾静, 胡石林, 吴全峰, 齐鑫, 周文辉. 化学气相沉积法制备高纯硼粉的技术进展[J]. 材料导报, 2021, 35(5): 5089-5094.
ZENG Jing, HU Shilin, WU Quanfeng, QI Xin, ZHOU Wenhui. A Technological Review of the Preparation of High Purity Boron Powder by Chemical Vapor Deposition. Materials Reports, 2021, 35(5): 5089-5094.
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