磺酸基与羧基修饰纳米二氧化硅:两种阴离子型纳米指纹显现材料的制备与应用

doi:10.11896/cldb.21020127

材料导报

2022, Vol. 36

Issue (5): 21020127-7 https://doi.org/10.11896/cldb.21020127

无机非金属及其复合材料

磺酸基与羧基修饰纳米二氧化硅:两种阴离子型纳米指纹显现材料的制备与应用

陈煜太^1,2, 黄威³, 姜红², 李珊¹, 王元凤¹

1 中国政法大学证据科学教育部重点实验室,北京 100080
2 中国人民公安大学侦查学院,北京 100038
3 公安部物证鉴定中心,北京 100038

Synthesis of the Carboxylic and Sulfonic SiO₂ and Its Application to Latent Fingermark Development

CHEN Yutai^1,2, HUANG Wei³, JIANG Hong², LI Shan¹, WANG Yuanfeng¹

1 Key Laboratory of Evidence Science, China University of Political Science and Law, Beijing 100080,China
2 People's Public Security University of China, Beijing 100038,China
3 Institute of Forensic Science, Ministry of Public Security, Beijing 100038,China

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摘要通过反相微乳液法制备包埋[Ru(bpy)₃]²⁺的纳米SiO₂,赋予指纹显现试剂高效光致发光性能和绿色环保优势;尝试使用氨基前驱体和氨解反应两步法,制得羧基表面修饰的纳米SiO₂;通过巯基前驱体和氧化反应两步法,制得磺酸基表面修饰的纳米SiO₂,并综合比较了羧基修饰和磺酸基修饰两种表面修饰路径的效果。实验结果表明,染料和包埋产物的紫外可见区吸收峰值分别在452.43 nm和476.06 nm,羧基修饰和磺酸基修饰纳米SiO₂的平均粒径约为40 nm,DLS粒径分别为122.4 nm和110.1 nm,Zeta电位分布峰值分别为-33.16 mV和-34.99 mV,两种体系对于悬浮液酸碱度的敏感程度存在差异,正交试验考察两种材料显现潜在指纹的最佳条件分别为稀释比例1∶3、pH值2.9、浸显时间5 min,稀释比例1∶5、pH值3.5、浸显时间5 min。此复合材料具有良好的显现效率和安全性。

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	陈煜太
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	王元凤

关键词: 指纹纳米二氧化硅荧光小颗粒悬浮液

Abstract: Silica nanoparticles embedded with [Ru(bpy)₃]²⁺ were synthesized by inverse microemulsion method, which endowed the fingerprint developing reagent with excellent photoluminescence and high safety. Carboxyl modified silica nanoparticles were prepared by a two-step method using amino precursor and ammonolysis reaction. Sulfonic acid modified silica nanoparticles were prepared by a two-step method using sulfhydryl precursor and oxidation reaction. The two types of negatively charged silica nanoparticles were compared comprehensively. It indicated that the absorption peaks of [Ru(bpy)₃]²⁺ and dye-doped nanoparticles in UV-Vis region were 452.43 nm and 476.06 nm, respectively. The average particle sizes of carboxyl and sulfonic acid modified silica nanoparticles were approximately 40 nm, and the DLS particle sizes were 122.4 nm and 110.1 nm, respectively. The peak values of Zeta potential distribution were -33.16 mV and -34.99 mV, respectively. When dispersed into the solution, carboxyl and sulfonic acid modified silica nanoparticles presented different sensitivities to the pH value of suspension. The optimized conditions for latent fingerprint development by the two negatively charged nanoparticles were achieved through orthogonal design experiment, which included dilution ratio 1∶3, pH value 2.9 and developing time 5 min for carboxylic SiO₂, and dilution ratio 1∶5, pH value 3.5 and developing time 5 min for sulfonic SiO₂. The newly synthesized nanocomposites are highly efficient and safe when utilized for latent fingerprint developing.

Key words: fingermark detecting nano silica fluorescence small particle reagent

出版日期: 2022-03-10 发布日期: 2022-03-08

ZTFLH:

O657.3

基金资助: 国家重点研发计划项目(2018YFC0807304);国家自然科学基金项目(61108075);中国政法大学校级科学研究规划项目(20116040)

通讯作者: yuanfengw@cupl.edu.cn

作者简介: 陈煜太,2019年6月毕业于中国人民公安大学,获得物证技术学硕士学位。于2017年3月至2019年6月在中国政法大学联合培养学习,主要从事阴离子修饰纳米二氧化硅的制备与应用。
王元凤,中国政法大学,教授。2008年7月毕业于中国人民公安大学,物证技术方向。同年加入证据科学教育部重点实验室工作至今,主要从事基于纳米材料的指纹显现试剂的研发,重点研究功能型纳米材料的合成并探索其在指纹显现领域的潜在应用。在国内外重要期刊发表文章50多篇,主持项目12项。

引用本文:

陈煜太, 黄威, 姜红, 李珊, 王元凤. 磺酸基与羧基修饰纳米二氧化硅:两种阴离子型纳米指纹显现材料的制备与应用[J]. 材料导报, 2022, 36(5): 21020127-7.
CHEN Yutai, HUANG Wei, JIANG Hong, LI Shan, WANG Yuanfeng. Synthesis of the Carboxylic and Sulfonic SiO₂ and Its Application to Latent Fingermark Development. Materials Reports, 2022, 36(5): 21020127-7.

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http://www.mater-rep.com/CN/10.11896/cldb.21020127 或 http://www.mater-rep.com/CN/Y2022/V36/I5/21020127

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