Effect of Nb, Hf and Zr on Oxidation Resistance of γ-TiAl Alloy
LAI Xuping1, LI Tianfang1, LIU Rui2, SUN Hongliang2
1 Naval Equipment Department, Chengdu 610036, China 2 School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu 610031, China
Abstract: Three kinds of alloys were melted by adding Nb, Hf and Zr elements on the basis of equal atomic ratio γ-TiAl based intermetallic compounds. The oxidation behavior of the three alloys in still air at 1 600 ℃ and at 700 ℃, 800 ℃ and 850 ℃ for 20 h was studied. The results show that there is an incubation period in the oxidation process of 4Nb-4Zr, 4Nb-4Hf and 8Nb at 1 600 ℃, and the rapid oxidation begins when the temperature rises above 1 000 ℃. However, there is no incubation period in the isothermal oxidation process at 700 ℃, 800 ℃ and 850 ℃, and the oxidation curve is parabolic. The parabolic constants Kp of the three alloys at 700 ℃, 800 ℃ and 850 ℃ were calculated and corrected. The oxide films of the three alloys are mainly composed of dense Al2O3 and loose TiO2. Alloying elements control the oxidation resistance of the alloy mainly by affecting the amount of dense Al2O3 in the oxide film. Hf plays an important role in improving the activity of Al in TiAl alloy. The amount of Al2O3 in the oxide film is the most, and the oxidation resistance of the alloy is the best. Nb is the second, Zr is the worst.
作者简介: 孙红亮,男,博士,副教授。主要从事钛铝合金的基础研究,热等静压、热压等粉末冶金的工艺研究工作。先后主持多项相关领域的国家自然科学基金,国家重点研发项目及横向项目。以第一作者或者通讯作者在Journal of Alloys and Compounds, Materials Research Innovations,Rare Me-tals, Materials & Manufacturing Processes等国际期刊发30余篇表论文,并担任多项国际期刊同行审阅人。申请专利近10项。赖旭平,海装西安局工程师,1998 年9月至2002年7月在哈尔滨工程大学获得材料科学与工程专业学士学位,毕业后一直从事核动力工程项目管理和质量监督工作,参与多项国家重点项目研发,特别是涉核领域系统设计、设备研制、材料研发等方面,发表文章10余篇,获国防科技进步奖三等奖一项,立三等功一次,多次享受高新工程津贴。
引用本文:
赖旭平, 李天方, 刘瑞, 孙红亮. 元素Nb、Hf、Zr对γ-TiAl合金抗氧化性能的影响[J]. 材料导报, 2021, 35(Z1): 374-377.
LAI Xuping, LI Tianfang, LIU Rui, SUN Hongliang. Effect of Nb, Hf and Zr on Oxidation Resistance of γ-TiAl Alloy. Materials Reports, 2021, 35(Z1): 374-377.