Preparation of Graphene by Rapid Electron Beam Annealing Method
XU Zhuang1, GAO Zhaoshun1,2, HAN Li1, ZUO Tingting1, WU Yue1, XIAO Liye1, KONG Xiangdong1
1 Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China; 2 Dalian National Laboratory for Clean Energy, Dalian 116000, China
Abstract: Based on the segregation mechanism of carbon atoms in metal materials, the preparation of graphene by heat treatment of carbon-doped nickel film required a very fast heating and cooling rate. The characteristic of electron beam annealing was that the heating rate was very fast, and the sample could be heated to the required temperature in a short time. Therefore, an electron beam annealing method was proposed to prepare graphene. The nickel film doped with a certain concentration of carbon atoms was heated in the electron beam heat treatment equipment at a certain temperature. When the concentration of carbon atom was 1%, the temperature range of preparing graphene by electron beam annealing method was determined to be 1 000—1 100 ℃, and only 5 s was needed to obtain high-quality graphene with good crystallinity and few defects. The segregation mechanism of carbon atoms in nickel film under the irradiation of electron beam was revealed. The high heating and cooling rate made the residence duration of Ni-C system in Ni-multilayer graphene and Ni-graphite phase interval very short, and the excess carbon atoms on the surface of nickel film were very few, thus forming high-quality single-layer graphene. The method of preparing graphene by electron beam annealing method had the advantages of high efficiency and safety, and improved the application advantages of graphene.
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