工作气压对磁控溅射TaN薄膜微结构和性能的影响

材料导报

2021, Vol. 35

Issue (z2): 60-63

无机非金属及其复合材料

工作气压对磁控溅射TaN薄膜微结构和性能的影响

张玉宝, 李志刚, 王艺, 蒋继成, 姚钢, 赵弘韬

黑龙江省原子能研究院,哈尔滨150086

Effect of Work Pressure on Microstructure and Properties of Magnetron Sputtering TaN Coatings

ZHANG Yubao, LI Zhigang, WANG Yi, JIANG Jicheng, YAO Gang, ZHAO Hongtao

Heilongjiang Institute of Atomic Energy, Harbin 150086, China

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摘要采用反应磁控溅射技术在Al₂O₃陶瓷基底上制备了一系列不同工作气压的TaN薄膜。分别利用X射线衍射仪(XRD)、原子力显微镜(AFM)、台阶仪、划痕仪和四探针电阻计研究不同工作气压对TaN薄膜的微观结构、粗糙度、沉积速率、膜-基结合力、电学性能的影响。结果表明,磁控溅射TaN薄膜主要为fcc δ-TaN晶体结构;在工作气压为0.4 Pa时,TaN薄膜的膜-基结合力和沉积速率最高、导电性和致密度最好,其结合力、沉积速率、方阻值和粗糙度分别为53.2 N、4.28 nm/min、45.06 Ω/□和1.09 nm。

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关键词: TaN薄膜氮气流量微观结构结合力电性能

Abstract: Aseries of TaN films with different working pressures were prepared on Al₂O₃ ceramic substrate by reactive magnetron sputtering technology. Using X-ray diffractometer (XRD), atomic force microscope (AFM), step profiler, scratch tester and four-probe resistance meter to study the influence of the microstructure, roughness, deposition rate, film-base bonding force and electrical performance of TaN films with different working pressures. The results show that the magnetron sputtering TaN films are mainly fcc δ-TaN crystal structure; when the working pressure is 0.4 Pa, the film-base bonding force and deposition rate of the TaN film are the highest, the conductivity and density are the best, and its bonding force, Deposition rate, square resistance and roughness are 53.2 N, 4.28 nm/min, 45.06 Ω/□ and 1.09 nm, respectively.

Key words: TaN film work pressure microstructure adhesion electrical properties

发布日期: 2021-12-09

ZTFLH:

TB321

基金资助: 黑龙江省科学院科研基金(KY2020WL02);黑龙江省科学院学科领域创新能力提升专项计划(XKLY2019WL01-03)

通讯作者: zhaohongtao2019@163.com

作者简介: 张玉宝,黑龙江省原子研究院副研究员,主要从事辐射技术及等离子体技术应用领域的研究。
赵弘韬,黑龙江省原子能研究院,研究员。2010年毕业于哈尔滨工业大学,现从事核技术应用领域的研究工作。

引用本文:

张玉宝, 李志刚, 王艺, 蒋继成, 姚钢, 赵弘韬. 工作气压对磁控溅射TaN薄膜微结构和性能的影响[J]. 材料导报, 2021, 35(z2): 60-63.
ZHANG Yubao, LI Zhigang, WANG Yi, JIANG Jicheng, YAO Gang, ZHAO Hongtao. Effect of Work Pressure on Microstructure and Properties of Magnetron Sputtering TaN Coatings. Materials Reports, 2021, 35(z2): 60-63.

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http://www.mater-rep.com/CN/ 或 http://www.mater-rep.com/CN/Y2021/V35/Iz2/60

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