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材料导报  2019, Vol. 33 Issue (Z2): 206-209    
  无机非金属及其复合材料 |
碳化硅单晶材料残余应力检测技术研究进展
邓亚, 张宇民, 周玉锋, 王伟
哈尔滨工业大学复合材料与结构研究所,哈尔滨 150080
Research Progress on Measurement of Residual Stress inSiC Single Crystal Materials
DENG Ya, ZHANG Yumin, ZHOU Yufeng, WANG Wei
Institute of Composite Material and Structure, Harbin Institute of Technology, Harbin 150080
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摘要 SiC单晶材料被称为第三代宽带隙半导体材料,凭借强度高、化学性质稳定、抗干扰能力强等优势被广泛应用于军工、核能和电子等领域。然而SiC单晶在制备、加工和使用过程中,往往会存在残余应力,这严重影响着单晶材料的质量和使用寿命。为准确评估晶体质量、服役过程中的可靠性和材料寿命,有必要对单晶材料的残余应力及分布规律进行深入研究。本文分析了SiC单晶中残余应力的来源,归纳总结了单晶材料应力检测技术的研究现状,并对SiC单晶材料应力检测方面的未来发展趋势进行了展望。
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邓亚
张宇民
周玉锋
王伟
关键词:  碳化硅单晶材料  残余应力  光弹性法  X射线衍射法  微拉曼光谱法    
Abstract: SiC single crystal materials, a typical representative of the third generation wide band-gap semiconductor materials, are widely used in military, nuclear energy and electronic applications due to their high strength, good chemical stability and strong anti-interference ability. However, residual stress often exists in the process of preparation, processing and use of SiC single crystal, which seriously affects the quality and service life of single crystal materials. In order to evaluate crystal quality, reliability and material life precisely, it is necessary to study the stress measurement and distribution of single crystal materials. In this paper, the source of residual stress in SiC single crystal is analyzed, the research status of stress detection technology for single crystal materials is reviewed and the developing trend of stress detection for SiC single crystal material are also discussed.
Key words:  SiC single crystal materials    residual stress    photoelastic method    X-ray diffraction method    micro-Raman spectrometry
               出版日期:  2019-11-25      发布日期:  2019-11-25
ZTFLH:  O765  
通讯作者:  zhouyf@hit.edu.cn   
作者简介:  邓亚,2016年6月毕业于山东理工大学,获得工学学士学位。现于哈尔滨工业大学复合材料与结构研究所攻读博士学位,在张宇民教授的指导下开展研究。目前主要研究领域为单晶材料的无损应力检测。
周玉锋,2008年12月毕业于哈尔滨工业大学,获得博士学位。主要从事材料无损应力检测等方面的研究。
引用本文:    
邓亚, 张宇民, 周玉锋, 王伟. 碳化硅单晶材料残余应力检测技术研究进展[J]. 材料导报, 2019, 33(Z2): 206-209.
DENG Ya, ZHANG Yumin, ZHOU Yufeng, WANG Wei. Research Progress on Measurement of Residual Stress inSiC Single Crystal Materials. Materials Reports, 2019, 33(Z2): 206-209.
链接本文:  
http://www.mater-rep.com/CN/  或          http://www.mater-rep.com/CN/Y2019/V33/IZ2/206
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