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材料导报  2024, Vol. 38 Issue (13): 22110222-5    https://doi.org/10.11896/cldb.22110222
  金属与金属基复合材料 |
铜箔衬底对化学气相沉积法制备石墨烯的影响
王云鹏1,2, 刘宇宁1,2, 王同波1,2, 张嘉凝1,2, 莫永达1,2, 娄花芬3,*
1 中国铜业工程技术研究院,北京 102209
2 昆明冶金研究院有限公司北京分公司,北京 102209
3 中铝科学技术研究院有限公司,北京 102209
Effects of Copper Foil Substrate on Graphene Growth by Chemical Vapor Deposition
WANG Yunpeng1,2, LIU Yuning1,2, WANG Tongbo1,2, ZHANG Jianing1,2, MO Yongda1,2, LOU Huafen3,*
1 China Copper Institute of Engineering and Technology, Beijing 102209, China
2 Kunming Metallurgical Research Institute Co., Ltd., Beijing Branch, Beijing 102209, China
3 Chinalco Research Institute of Science and Technology Co., Ltd., Beijing 102209, China
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摘要 化学气相沉积法(CVD)制备石墨烯用的铜箔往往要求其表面平整、具有较大晶粒、大面积的Cu(111)晶面取向。本研究采用不同厚度的商用压延铜箔与电解铜箔为衬底,对比分析了铜箔表面形貌、晶粒尺度与Cu(111)面的差异,并探讨了在相同条件下两类铜箔对生长石墨烯的影响。研究表明,电解铜箔的表面粗糙度在预处理与退火后均大于压延铜箔。压延铜箔由于经历变形,退火处理后晶粒尺寸为37 μm,Cu(111)面比例约40%,电解铜箔退火后晶粒尺寸约为24 μm,Cu(111)面比例约为28%,压延铜箔优于电解铜箔。CVD制备石墨烯后发现压延铜箔上生长的石墨烯岛的面积大于电解铜箔,石墨烯缺陷要少于电解铜箔,即相同制备条件与相同厚度下压延铜箔上制备的石墨烯质量优于电解铜箔上制备的石墨烯。
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王云鹏
刘宇宁
王同波
张嘉凝
莫永达
娄花芬
关键词:  电解铜箔  压延铜箔  化学气相沉积法  石墨烯    
Abstract: Copper foil for graphene growth by chemical vapor deposition (CVD) usually requires smooth surface, large grain size and large area of Cu (111) crystal face. In this study, commercial rolled copper foil and electrolytic copper foil with different thickness were used to prepare graphene. The differences of copper foil surface morphology, grain size and the proportion of Cu (111) crystal face were compared, and the differences of graphene grown on the two kinds of copper foil under the same preparation conditions were discussed. It was found that the surface roughness of electrolytic copper foil was larger than that of rolled copper foil after surface pretreatment and annealing treatment. Due to the large deformation experienced by the rolled copper foil, the grain size of annealed copper foil was about 37 μm and the proportion of Cu (111) crystal face was about 40%, while that of electrolytic copper foil was about 24 μm and the proportion of Cu (111) crystal face was about 28%. The area of graphene was land on rolled copper foil was larger than that of electrolytic copper foil, and the defects of graphene was less than that of electrolytic copper foil. The graphene prepared on rolled copper foil was better than that on electrolytic copper foil under the same conditions.
Key words:  electrolytic copper foil    rolled copper foil    chemical vapor deposition (CVD)    graphene
出版日期:  2024-07-10      发布日期:  2024-08-01
ZTFLH:  TG146.1+1  
基金资助: 北京市科技计划课题(Z211100004521005);中铝集团战略前沿技术重大专项(2022ZL015013)
通讯作者:  *娄花芬,教授级高级工程师,国务院政府特殊津贴专家。2009年6月毕业于中南大学材料物理专业,获工学博士学位。长期从事铜、镁等有色金属材料的研制和新技术研发工作,在高纯无氧铜、高强高导铜合金、高强耐磨复杂铜合金、耐蚀铜合金、环境友好铜材及定向凝固、铸轧等短流程近终成型技术等方面进行深入研究。主持完成多项国家及省、市重大科研项目和军工科研项目。发表学术论文30余篇,编写专业著作4部,获国家发明专利30余件。历获国家科技进步奖二等奖1项,省部级科技进步一等奖7项,二等奖8项。louhuafen@cmari.com   
作者简介:  王云鹏,中铝集团中国铜业工程技术研究院工程师。2019年1月毕业于燕山大学材料科学与工程学院材料学专业,获得工学博士学位。同年加入中铝集团工作至今,主要从事先进铜合金、铜基复合材料研发、铜合金应用性能、铅锌锗等有色金属材料提纯及应用等领域的研究。在国内外重要期刊发表学术论文20余篇,2022年获得有色金属工业协会科学技术一等奖1项。
引用本文:    
王云鹏, 刘宇宁, 王同波, 张嘉凝, 莫永达, 娄花芬. 铜箔衬底对化学气相沉积法制备石墨烯的影响[J]. 材料导报, 2024, 38(13): 22110222-5.
WANG Yunpeng, LIU Yuning, WANG Tongbo, ZHANG Jianing, MO Yongda, LOU Huafen. Effects of Copper Foil Substrate on Graphene Growth by Chemical Vapor Deposition. Materials Reports, 2024, 38(13): 22110222-5.
链接本文:  
http://www.mater-rep.com/CN/10.11896/cldb.22110222  或          http://www.mater-rep.com/CN/Y2024/V38/I13/22110222
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