In-situ Nanoindentation Investigation of Mechanical Properties of Al2O3 Ultra-thin Nanofilm Grown by Atomic Layer Deposition
LIU Lyuhong1,2, LIU Yanping1, MA Jinyao2, SANG Lijun2, CHENG Xiaopeng2, ZHANG Yuefei2
1 School of Mechanical and Vehicle Engineering, Taiyuan University of Technology, Taiyuan 030024 2 Institute of Microstructure and Property of Advanced Materials, Beijing University of Technology, Beijing 100124
Abstract: Five Al2O3 nanofilms with thickness of 20—60 nm were deposited by atomic layer deposition(ALD). The surface roughness and microstructure of the deposited Al2O3 nanofilms were characterized by three dimensional optical microscopy and transmission electron microscopy. The force-displacement curves captured by a hybrid scanning electron microscope/scanning probe microscope(SEM/SPM)system were analyzed based on Hertz’s theory of contact mechanics for the elastic modulus of Al2O3 nanofilms. The Hay model was used to eliminate the influence of the substrate on the measurement results, and the errors in the model due to the different shapes of the indenter were corrected. The results show that, ALD Al2O3 nanofilms is amorphous, and the surface roughness does not increase with the increase of thickness. The elastic modulus do not show obvious small size effect, and the measured value is (175±10) GPa. Under the same indentation ratio, the smaller the film thickness is, the more obvious the substrate effect is.
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2019, Vol. 33 
