玻璃微探针电沉积的微结构制造路径规划

doi:10.11896/cldb.23100020

材料导报

2025, Vol. 39

Issue (5): 23100020-7 https://doi.org/10.11896/cldb.23100020

金属与金属基复合材料

玻璃微探针电沉积的微结构制造路径规划

徐海黎^1,†, 杨雅雯^1,†, 邢强^1,*, 陈妍¹, 廖晓波², 张小萍¹, 庄健³

1 南通大学机械工程学院,江苏南通 226019
2 西南科技大学制造过程测试技术教育部重点实验室,四川绵阳 621010
3 西安交通大学机械工程学院,西安 710049

Microstructure Fabrication Path Planning for Glass Microprobe Electrodeposition

XU Haili^1,†, YANG Yawen^1,†, XING Qiang^1,*, CHEN Yan¹, LIAO Xiaobo², ZHANG Xiaoping¹, ZHUANG Jian³

1 School of Mechanical Engineering, Nantong University, Nantong 226019, Jiangsu, China
2 Key Laboratory of Testing Technology for Manufacturing Process, Minsitry of Education, Southwest University of Science and Technology, Mianyang 621010, Sichuan, China
3 School of Mechanical Engineering, Xi’an Jiaotong University, Xi’an 710049, China

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摘要为了实现半月形液滴限制电化学沉积(Meniscus confined electrodeposition,MCED)在二维平面的快速稳定生长,提出了自适应微跳跃分区沉积(Adaptive micro-jump partitioned deposition,AMJPD)方法。该方法利用扫描电化学池显微镜 (Scanning electrochemical cell microscopy,SECCM)获取沉积二维平面方程,结合预沉积图像的分区扫描沉积轨迹生成基于该平面的三维沉积路径,通过提出的自适应微跳跃沉积模式,合理规避了平面生长沉积时遇到的阻碍,实现了在微米尺度上快速可控的平面制造加工。实验结果表明,AMJPD方法可进行多线段和平面图形的沉积绘制,可实现线宽6 μm、长宽比17∶1微线条的稳定制造。因此,所提出的AMJPD方法可应用于各类精密金属微结构和微部件的制造,未来将在精密器件制造、生命医学传感等相关领域得到广泛应用。

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	徐海黎
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	陈妍
	廖晓波
	张小萍
	庄健

关键词: 半月形液滴限制电化学沉积微跳跃沉积模式分区扫描自适应平面增材制造

Abstract: In order to achieve rapid and stable planar growth of meniscus confined electrodeposition (MCED) in a two-dimensional planar, an adaptive micro-jump partitioned deposition (AMJPD) method is proposed. This method utilizes scanning electrochemical cell microscopy (SECCM) to obtain the equations of the deposition plane, and combines it with the partitioned scanned deposition path from pre-deposited images to gene-rate a three-dimensional deposition path based on this plane. By introducing the proposed adaptive micro-jump deposition mode, obstacles encountered during planar growth deposition are effectively circumvented, enabling rapid and controllable planar manufacturing at the microscale. Experimental results show that the AMJPD method can be used for the deposition drawing of multiple line segments and planar patterns, achieving stable fabrication of micro lines with a width of 6 μm and an aspect ratio of 17∶1. Therefore, the AMJPD method proposed can be applied to the fabrication of various precision metal microstructures and micro-components, and should be widely used in the future in precision device fabrication, life medicine sensing and other related fields.

Key words: meniscus confined electrodeposition micro-jump deposition mode partition scanning adaptive planes additive manufacturing

出版日期: 2025-03-10 发布日期: 2025-03-18

ZTFLH:

TG156

基金资助: 国家自然科学基金面上项目(52175515);南通市科技项目(JC2021034)

通讯作者: ^*邢强,南通大学副教授,主要研究方向为仿生视觉感知与智能系统研究。meexq@ntu.edu.cn

作者简介: 徐海黎,南通大学机械工程学院教授、硕士研究生导师。目前主要从事机械系统的智能控制与信息处理等方面的研究。
杨雅雯,现为南通大学机械工程学院硕士研究生。目前主要从事机械系统的智能控制与信息处理等方面的研究。^†共同第一作者

引用本文:

徐海黎, 杨雅雯, 邢强, 陈妍, 廖晓波, 张小萍, 庄健. 玻璃微探针电沉积的微结构制造路径规划[J]. 材料导报, 2025, 39(5): 23100020-7.
XU Haili, YANG Yawen, XING Qiang, CHEN Yan, LIAO Xiaobo, ZHANG Xiaoping, ZHUANG Jian. Microstructure Fabrication Path Planning for Glass Microprobe Electrodeposition. Materials Reports, 2025, 39(5): 23100020-7.

链接本文:

https://www.mater-rep.com/CN/10.11896/cldb.23100020 或 https://www.mater-rep.com/CN/Y2025/V39/I5/23100020

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