Abstract: In order to study the optimal process parameters of mask-less localized electrodeposition based on jet state, COMSOL Multiphysics simulation software and experiment were used to study the effects of current density, interelectrode gap, pulse duty ratio on the surface morphology and deposition rate of the deposition parts in the process of 3D microstructures without mask. The analysis results showed that the current density had a great influence on the morphology, grain size, internal pores and deposition rate of the deposition parts. When the current density exceeded 4.5 A/dm2, the surface morphology and pores dramatically deteriorated; the smaller the duty cycle, the better the localization; the smaller the diameter of the deposited cylinder, and the more uniform the sedimentation layer can be obtained when the polar spacing was 5 μm. The process parameters obtained by orthogonal experiment optimization were: current density 3.5 A/dm2, pole spacing of 5 μm, pulse duty-ratio of 10%.
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