Influence of Deposition Parameters on Microstructure and Properties of Plasma-enhanced, Magnetron-sputtered TiAlN Coatings
ZHANG Yanan, ZHOU Zichao, ZHANG Hao*, XIAO Yuqi, DENG Na, FU Binyun, DUO Shuwang
Jiangxi Key Laboratory of Surface Engineering, School of Materials and Mechanical & Electrical Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, China
Abstract: In this study, an orthogonal test method was introduced. The wettability of TiAlN coatings deposited by plasma enhanced magnetron sputtering was selected as the experimental indicator. Furthermore, target power, Ar/N2 flow ratio and negative bias voltage were sensitivity analysis on the indicator. The chemical composition, crystal structure, micro-morphology and surface roughness of TiAlN coatings were characterized using energy dispersive spectrometer (EDS), X-ray diffractometer (XRD), field emission scanning electron microscope (FE-SEM) and atomic force microscope (AFM). The wettability of TiAlN coatings was analyzed with the contact angle. Range analysis shows that the factors with the highest sensitivity to the Al content within the coating are Al target power and Ar/N2 flow rate ratio, and the highest sensitivity to the grain size, roughness and contact angle of the coating is the negative bias voltage. The coating produced by S2 process shows the best hydrophobic property with contact angle of 120.25°, while the coating prepared by S9 process presents the strongest hydrophilic property with contact angle of 15.15°. This study provides some directions and ideas for an appropriate selection of coating deposition parameters based on engineering applications.
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2022, Vol. 36 
