Abstract: With the increasing demand of low-cost crystalline silicon material for photovoltaic industry, people gradually pay close attention to silicon growth technology at low-temperature. This technique is that crystalline silicon can be produced in the low temperature process, in which silicon is firstly alloyed with low-melting-point metals and then recrystallized, i.e. liquid phase epitaxy and directional solidification refining techniques. In this review, based on the basic principle of silicon growth techniques, the current situations of research and applications of liquid phase epitaxy and directional solidification are reviewed in this work.In addition, the current problems and the research direction of silicon growth technology are presented.
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