Research Progress of MPCVD Homogeneous Epitaxial Single-crystal Diamond
DONG Haoyong1, REN Ying2, ZHANG Guifeng1,*
1 Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China 2 School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China
Abstract: The microwave plasma chemical vapor deposition (MPCVD) method is considered one of the most promising techniques for preparing large-size and high-quality epitaxial single-crystal diamonds. In this paper, the growth mechanism and the latest progress of MPCVD homogeneous epitaxial single crystal diamonds are briefly introduced, and then the work of preparing large-size and high-quality single crystal diamonds by MPCVD method in seed crystal screening and pretreatment, substrate structure design, and growth process exploration is emphatically described. The applications of MPCVD high-quality single-crystal diamonds in the fields of mechanics, thermal, optics, and electronics are introduced, and the application prospects of single-crystal diamonds in the future are forecasted.
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