Analysis of Film Thickness Uniformity and Design of Correction Baffles for the Asynchronous Mass-Energy Thin Film Deposition System
LYU Liang1, WANG Yuxiang2, XIA Zhilin2, YU Siyuan3,*
1 School of Astronautics, Harbin Institute of Technology, Harbin 150001, China 2 School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China 3 School of Instrument Science and Engineering, Harbin Institute of Technology, Harbin 150001, China
Abstract: To meet the high requirements for thickness uniformity of large-size optical thin films in space optical systems, this work conducts modeling and analysis of film thickness uniformity for a self-designed mass-energy asynchronous magnetron sputtering thin film deposition system. This system effectively suppresses nodule defects and thereby improves the laser damage threshold of the film by discretizing the thin film deposition process and introducing variable-angle auxiliary ion beam bombardment. On this basis, a calculation model of film thickness distribution sui-table for this device is constructed, and the influence laws of structural parameters such as target width, target height, the distance between the target and the axis of the sample holder, and the radius of the sample holder on film thickness uniformity are systematically analyzed. The calculation results show that:the target width has a relatively small impact on film thickness uniformity;the larger the target height, the more uniform the film thickness distribution in the vertical direction;when the distance between the target and the sample holder is less than 1.5 times the radius of the sample holder, the film thickness uniformity becomes worse as the distance increases;when this distance exceeds 1.5 times, the uniformity is instead improved;in addition, the change in the radius of the sample holder has no significant effect on the film thickness distribution. When the optimization effect of adjusting the above structural parameters is limited, this paper designs a film thickness correction baffle, which uses the ori-ginal film thickness distribution information obtained by simulation to regulate the effective working area of the target. The correction results show that the film thickness uniformity of the sample is significanty improved, and the initial difference coefficient decreased from more than 0.35 to less than 0.005, and the thickness difference corresponding to a 100 nm film thickness is only 0.5 nm, which significantly improves the film thickness control accuracy. The research results provide theoretical guidance for the structural optimization of complex deposition systems and also provide technical support for the batch preparation of high-uniformity optical thin film components.
吕亮, 王宇翔, 夏志林, 于思源. 质能异步化薄膜沉积系统的膜厚均匀性分析与修正挡板设计[J]. 材料导报, 2025, 39(23): 25060088-6.
LYU Liang, WANG Yuxiang, XIA Zhilin, YU Siyuan. Analysis of Film Thickness Uniformity and Design of Correction Baffles for the Asynchronous Mass-Energy Thin Film Deposition System. Materials Reports, 2025, 39(23): 25060088-6.
1 Liu X Z, Xu D, Li D, et al. Acta Aeronautica et Astronautica Sinica, 2024, 45(19), 292(in Chinese). 刘显著, 徐达, 李栋, 等. 航空学报, 2024, 45(19), 292. 2 Coder R D, Holzinger M J. Acta Astronautica, 2016, 128, 669. 3 He L, Wang X Y, Tian H S, et al. Materials Reports, 2024, 38(Z1), 38(in Chinese). 何亮, 王祥宇, 田浩生, 等. 材料导报, 2024, 38 (Z1), 38. 4 Yang Y, Wang W H, Li L S, et al. Materials Reports, 2025, 39(10), 26(in Chinese). 杨宇, 王伟华, 李连升, 等. 材料导报, 2025, 39(10), 26. 5 Miao Y, Li J C, Lin H A, et al. Optical Engineering, 2023, 62, 065107. 6 Huang C, Li J P, Cai Z H, et al. Photonics, 2023, 10, 768. 7 Ling X L, Liu S H, Liu X F. Thin Solid Films, 2020, 703, 137974. 1. 8 Chen Z, Tian Y, Zhu J, et al. Crystals, 2023, 13, 571. 9 Xie L Y, He T, Zhang J L, et al. High Power Laser and Particle Beams, 2018, 30(9), 092001(in Chinese). 谢凌云, 何涛, 张锦龙, 等. 强激光与粒子束, 2018, 30(9) 092001. 10 Zhang S M, Su Z Y, Menoni C S, et al. Optics Letters, 2023, 48(12), 1212. 11 夏志林, 肖迎澳. 中国专利, 202411726282. 3, 2024. 12 Liu X Y, Zhao L, Xu S, et al. Vacuum, 2003, 3(4), 16(in Chinese). 刘翔宇, 赵来, 许生, 等. 真空, 2003, 3(4), 16. 13 Fu C L, Yang C R, Han L G, et al. Surface and Coatings Technology, 2006, 200, 3687. 14 Liu H X, Hang L X, Xue J. Optical Instruments, 2014, 36(4), 364(in Chinese). 刘昊轩, 杭凌侠, 薛俊. 光学仪器, 2014, 36(4), 364. 15 Zhang Y N, Zhou Z C, Zhang H, et al. Materials Reports, 2022, 36(24), 47(in Chinese). 张亚南, 周子超, 张豪, 等. 材料导报, 2022, 36(24), 47. 16 Pan Y G, Liu Z, Wang B, et al. Laser & Optoelectronics Progress, 2021, 58(5), 331(in Chinese). 潘永刚, 刘政, 王奔, 等. 激光与光电子学进展, 2021, 58(5), 331. 17 Filip A V, Sava B A, Medianu R V, et al. Inorganics, 2022, 10, 235. 18 Shin S J, Bayu A L B, Bae J H, et al. Journal of Applied Physics, 2021, 130(12), 125305. 19 Wei B Y, Liu D M, Fu X H, et al. Acta Optica Sinica, 2021, 41(7), 222(in Chinese). 魏博洋, 刘冬梅, 付秀华, 等. 光学学报, 2021, 41(7), 222. 20 Jetjamnong C, Chotikaprakhan S, Kowong R, et al. Vacuum, 2022, 196, 110777. 21 Petroski K A, Sagás J C. Vacuum, 2020, 182, 109703. 22 Mattox D M. Handbook of physical vapor deposition (PVD) processing, William Andrew Publishing, Norwich, NY, 2010, pp. 333 23 Wu H, Zhang W P, Wang L H. Equipment for Electronic Products Manufacturing, 2024, 53(1), 24(in Chinese). 吴海, 张文朋, 王露寒. 电子工业专用设备, 2024, 53(1), 24.
渝公网安备50019002502923号 版权所有：《材料导报》编辑部
2025, Vol. 39 
