An Improved Copper Etching Method that Involves PMMA/PVA Dual Support Membranes and Serves to Transfer Graphene
WANG Shengtao1,2, LU Weier1,3, WANG Tong1, XIA Yang1,4
1 Microelectronic Instrument and Equipment Research Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 2 College of Science, Beijing Jiaotong University, Beijing 100044 3 Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 4 University of Chinese Academy of Sciences, Beijing 101407
Abstract: Graphene has been regarded as a promising material with wide applications in microelectronic devices, biosensors, fuel cells and energy sto-rage devices owing to its unique properties, such as high carrier mobility, high thermal conductivity and high mechanical strength. How to transfer graphene onto relevant substrates while minimising resin residues and cracks deserves is a crucial point for fabricating electronic devices using graphene. The conventional graphene transfer technology based on copper etching method has been plagued by the defect of surface pollution resulting from the unresolved and remained PMMA. We herein proposed an improved copper etching method, i.e. PMMA/PVA dual support membranes method, by indroducing a layer of polyvinyl alcohol (PVA,98% alcoholysis) with high water solubility to serve as the barrier layer between PMMA (providing high strength) and graphene. According to the results of optical microscopy (OM), Raman spectroscopy and electrical properties measurement, the transferred graphene with less residual, clean surface, high crystallinity and satisfactory back gate field effect transistor (BGFET) carrier mobility can be obtained through this improved copper etching method. Moreover, this method also has the advantages of both simple operation and potential universality for the transfer of other two-dimensional materials.
王胜涛, 卢维尔, 王桐, 夏洋. PMMA/PVA双支撑膜辅助铜刻蚀法:一种改进的石墨烯转移技术[J]. 材料导报, 2019, 33(2): 230-233.
WANG Shengtao, LU Weier, WANG Tong, XIA Yang. An Improved Copper Etching Method that Involves PMMA/PVA Dual Support Membranes and Serves to Transfer Graphene. Materials Reports, 2019, 33(2): 230-233.
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2019, Vol. 33 
