基于外加热激励源的中红外激光辐照VO<sub>2</sub>薄膜温升研究

doi:10.11896/j.issn.1005-023X.2017.024.018

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Abstract The VO₂ thin film has shown a great significance in the field of mid-infrared laser protection. To research the cumulative effects of temperature rise of VO₂ thin films under the irradiation of mid-infrared laser and to overcome the low power difficulty, a kind of external heat source method was designed. At first, the temperature accumulation of VO₂ thin film under mid-infrared nanosecond pulse laser irradiation at different temperature of external heat source and different power density was simulated by ANSYS software and verified in practice. It was shown that the laser power density, which could induce phase transition temperature within a certain time (100 s), decreased gradually with the increase of external heat source temperature. The essential temperature could be also reduced by increasing laser power density. And both of them could improve the temperature rising rate of VO₂ thin films. Then the temperature accumulation effect of VO₂ thin films irradiated by different mid-infrared nanosecond pulse laser parameters under the condition of 40 ℃ external heat source temperature and 1 W/mm² infrared laser power density was researched. The results showed that expanding laser pulse width, increasing repetition frequency and increasing facula radius could effectively increase the temperature rising rate of VO₂ thin films.

Key words： VO₂ thin films mid-infrared nanosecond pulse laser external heat source temperature accumulation effect

Published: 08 May 2018

CLC number:

TB321

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	Articles by authors
	HOU Dianxin
	LU Yuan
	LIU Zhiwei
	HU Jie

Cite this article:

HOU Dianxin,LU Yuan,LIU Zhiwei, et al. Temperature Rising in VO₂ Thin Films Under Irradiation of Mid-infrared Laser Based on External Heat Source[J]. Materials Reports, 2017, 31(24): 91-95.

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http://www.mater-rep.com/EN/10.11896/j.issn.1005-023X.2017.024.018 OR http://www.mater-rep.com/EN/Y2017/V31/I24/91

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