Abstract: Block copolymer nano-etching technology has attracted wide attention in the field of integrated circuit silicon chip and biochip because of its advantages of mass production. We further improved the technique. The self-assembly template of block copolymer was obtained by spin coa-ting, then the corresponding SiHx nano-pits were fabricated on the silicon surface by wet etching, and further the nano-array structure of polymer brushes was generated. The morphology was imaged by atomic force microscope (AFM), and the surface molecular structure was characterized by multiple transmitter-reflection infrared spectroscopy (MTR-IR) in each step for the whole sequential stepwise reactions. In addition, according to the observed dendritic structure in the AFM images, the growth mechanism of dendritic appearence and diffusion restricted aggregation of polymer brushes was proposed.
路小彬. 基于嵌段共聚物的硅表面聚合物刷点阵组装[J]. 材料导报, 2019, 33(z1): 505-509.
LU Xiaobin. Array Assembly of Polymer Brushes on Silicon Surface Based on Block Copolymer. Materials Reports, 2019, 33(z1): 505-509.
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2019, Vol. 33 
