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| A Review of Chemical Vapor Deposition for Synthesis of Boron Nitride Nanotubes:Reaction Devices, Vapor Sources and Catalysts |
| LONG Xiaoyang1,2, E Songfeng2, LI Chaowei2 , LI Taotao2 , WU Jun1, YAO Yagang2
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1 The State Key Laboratory of Refractories and Metallurgy, Faculty of Materials and Metallurgy, Wuhan University of Science and Technology, Wuhan 430081;
2 Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215000 |
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Abstract Boron nitride nanotubes (BNNTs) have great application potential in aerospace radiation shielding materials, thermal interface materials, deep ultraviolet emission materials and many other fields due to their excellent performances—oxidation resistance, radiation shield, heat conduction and so forth. However, BNNTs’ controllable and large scale preparation still faces an enormous challenge. Among the different kinds of BNNTs’ preparation methods, chemical vapor deposition (CVD) is one of the most promising methods for its controllable preparation. Nevertheless, scientists have not reached a consensus on the growth mechanism and influencing factors of BNNTs’ synthesis by CVD. Hence, this article provides a review on preparation of BNNTs by CVD, and a discussion about the effects of reaction devices, nitrogen sources, boron sources and catalysts. Besides, the unsettled issues and a prospect for the controllable synthesis of BNNT by CVD are also proposed.
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Published: 07 May 2018
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2017, Vol. 31 
