N<sub>2</sub>流量对反应共溅射TiN/Ni纳米复合膜结构和结合强度的影响

doi:10.11896/j.issn.1005-023X.2018.12.018

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Abstract A series of TiN/Ni nanocomposite thin films were deposited on Si (100) and 304 stainless steel substrates at diffe-rent N₂ flow rates by reactive magnetron co-sputtering on Ti and Ni targets. The N₂ flow rate dependences of the microstructure, adhesion strength and friction coefficient of the deposited films were studied by using atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, field emission scanning electron microscopy and scratch test. The TiN/Ni film has a fine microstructure, a smooth and dense surface, and an fcc structure with a dominant orientation of the (111) plane. The rise of N₂ flow rate causes the declines in porosity, grain size and deposition rate, and the biphasic (increase → decrease) changes of both surface roughness and adhesion strength of the resultant composite film. The smallest surface roughness, the highest adhesion strength and the lowest friction coefficient can be achieved by applying a N₂ flow rate of 16 mL/min, and their values are 2.75 nm,44.6 N and 0.14, respectively.

Key words： TiN/Ni nanocomposite film reactive magnetron co-sputtering microstructure N₂ flow rate adhesion strength

Published: 20 July 2018

CLC number:	TB79
	TB34
	TB321

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	Articles by authors
	HE Chunlin
	GAO Jianjun
	WANG Lingfei
	MA Guofeng
	LIU Yan
	WANG Jianming

Cite this article:

HE Chunlin,GAO Jianjun,WANG Lingfei, et al. Effect of N₂ Flow Rate on Microstructure and Adhesion Strength of Reactive Magnetron Co-sputtered TiN/Ni Nanocomposite Films[J]. Materials Reports, 2018, 32(12): 2038-2042.

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http://www.mater-rep.com/EN/10.11896/j.issn.1005-023X.2018.12.018 OR http://www.mater-rep.com/EN/Y2018/V32/I12/2038

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