MPCVD同质外延单晶金刚石研究进展

doi:10.11896/cldb.21100019

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Abstract The microwave plasma chemical vapor deposition (MPCVD) method is considered one of the most promising techniques for preparing large-size and high-quality epitaxial single-crystal diamonds. In this paper, the growth mechanism and the latest progress of MPCVD homogeneous epitaxial single crystal diamonds are briefly introduced, and then the work of preparing large-size and high-quality single crystal diamonds by MPCVD method in seed crystal screening and pretreatment, substrate structure design, and growth process exploration is emphatically described. The applications of MPCVD high-quality single-crystal diamonds in the fields of mechanics, thermal, optics, and electronics are introduced, and the application prospects of single-crystal diamonds in the future are forecasted.

Key words： MPCVD homoepitaxy single crystal diamond growth process abutment structure design application field

Published: 25 August 2023 Online: 2023-08-14

CLC number:

TB321

Fund:Natural Science Project of Science and Technology Department of Henan Province (222102230040) and Zhengzhou Major Science and Technology Programs in 2021 (2021KJZX062).

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	DONG Haoyong
	REN Ying
	ZHANG Guifeng

Cite this article:

DONG Haoyong,REN Ying,ZHANG Guifeng. Research Progress of MPCVD Homogeneous Epitaxial Single-crystal Diamond[J]. Materials Reports, 2023, 37(16): 21100019-8.

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http://www.mater-rep.com/EN/10.11896/cldb.21100019 OR http://www.mater-rep.com/EN/Y2023/V37/I16/21100019

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