Ti-Si-N纳米多层膜的研究进展

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Abstract Due to the disadvantages of poor oxidation at high temperature and inherent brittleness of TiN, Si is mixed into TiN network to form Ti-Si-N nano-multilayers. The hardness of the nano-multilayer films was significantly improved. Ti-Si-N nano-multilayers is a kind of new material with broad application prospects. It is widely used in coating, aerospace industry, tool hardening electronic devices and many other fields. Especially in the field of cemented carbide tools, higher hardness, wear resistance and toughness can extend tool life.
The preparation methods of Ti-Si-N nano-multilayers include physical vapor deposition and chemical vapor deposition. Physical vapor deposition is the evaporation of raw materials at one end of the cavity, and then deposited on the cooler substrate at the other end of the cavity. Chemical vapor deposition (CVD) is a chemical reaction at high temperature, which makes Ti, Si and N atoms recombine to form Ti-Si-N nano-multilayer films on the surface of the substrate. Compared with physical vapor deposition method, chemical vapor deposition method needs higher temperature, there are dangerous gases such as SiH₄ in the chemical reaction, and is not suitable for large-scale industrial production. Ti-Si-N nano-multilayers are mainly affected by Si content, modulation period and heat treatment temperature. With the increase of Si content, the properties of nano-multilayers first increase and then decrease. When Si content is 2.76%, the hardness of nano-multilayers is the highest and the friction coefficient is the smallest. The properties of multilayers with different modulation periods are better than that of monolayers. When the modulation pe-riod is 0.7 nm, the hardness of nano-multilayers reaches 28.7 GPa and the elastic modulus is 301.1 GPa. With the increase of fire temperature, the adhesion of nano-multilayers first increases and then decreases. The hardness of nano-multilayers reaches (49.7±0.83) GPa and the binding force is 83 N at 800—950 ℃. Nano-multilayer films have super-hardness, wear resistance and high temperature oxidation resistance. Different scholars have put forward different strengthening theories for the superhard properties of nano-multilayers: alternating stress field, modulus diffe-rence and Hall-petch strengthening theory; wear mechanism of nano-multilayers can be judged by friction and wear experiments; Ti-Si-N nano-multilayers formed by adding Si element in TiN have high temperature oxidation resistance.

Key words： Ti-Si-N nano-multilayer films thermal stability tribological properties

Published: 25 November 2019

CLC number:

TB43

Fund:This work was financially supported by the National Natural Science Foundation of China (51575004,51775044,11704008), Yuyou Youth and Yuyou Team Program and Student Science and Technology Activities of North China University of Technology.

About author:: Ruilu Han graduated from Zhengzhou University in June 2018 with a bachelor’s degree in engineering. Now she is a graduate student of mechanical engineering major in North China University of Technology. Research direction is the high temperature properties of nano-multilayers.
Hongjuan Yan, Ph.D, senior experimenter. Research directions is surface modification technology, preparation and characterization of superhard films.

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HAN Ruilu,YAN Hongjuan. Current Research Status of Ti-Si-N Nano-multilayer Films[J]. Materials Reports, 2019, 33(Z2): 169-174.

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http://www.mater-rep.com/EN/ OR http://www.mater-rep.com/EN/Y2019/V33/IZ2/169

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