利用合金低温生长晶体硅的研究进展

doi:10.11896/j.issn.1005-023X.2017.01.015

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Abstract With the increasing demand of low-cost crystalline silicon material for photovoltaic industry, people gradually pay close attention to silicon growth technology at low-temperature. This technique is that crystalline silicon can be produced in the low temperature process, in which silicon is firstly alloyed with low-melting-point metals and then recrystallized, i.e. liquid phase epitaxy and directional solidification refining techniques. In this review, based on the basic principle of silicon growth techniques, the current situations of research and applications of liquid phase epitaxy and directional solidification are reviewed in this work.In addition, the current problems and the research direction of silicon growth technology are presented.

Key words： crystalline silicon alloy low temperature growth technique

Published: 10 January 2017 Online: 2018-05-02

CLC number:	TB34
	TF89

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	Articles by authors
	MA Yusheng
	ZHANG Lifeng
	LI Yaqiong
	Rowaid Raad Muslim

Cite this article:

MA Yusheng,ZHANG Lifeng,LI Yaqiong, et al. Growing Crystalline Silicon with the Aid of Alloy Solvent at Low Temperature[J]. Materials Reports, 2017, 31(1): 110-115.

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https://www.mater-rep.com/EN/10.11896/j.issn.1005-023X.2017.01.015 OR https://www.mater-rep.com/EN/Y2017/V31/I1/110

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