真空热处理对金刚石基Ta<i><sub>x</sub></i>N薄膜微观结构及电学性能的影响

doi:10.11896/cldb.24060003

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Abstract Tantalum nitride (Ta_xN) thin films are widely used as thin film resistor materials in a wide variety of wireless electronic devices and systems due to their excellent electrical properties and stability, but conventional ceramic substrates are no longer able to meet the increasingly high requirements for thin film resistors in terms of operating frequency and operating power dissipation. CVD diamond is an ideal choice for high demand and high reliability thin film resistors due to its unparalleled advantages in RF and thermal properties. In this work, CVD diamond was chosen as the resistor substrate, and Ta_xN thin films were coated on the CVD diamond substrate by reactive direct current (DC) magnetron sputtering. Then the vacuum heat treatment process was carried out to the films at different temperatures under high vacuum. The changes of physical structure and surface morphology of Ta_xN thin films after vacuum heat treatment at different temperatures were analyzed, and the electrical pro-perties of the samples were tested by applying a four-probe system to investigate the effect of vacuum heat treatment on the electrical properties of Ta_xN thin films. The findings show that, with the increase of vacuum heat treatment temperature, the physical phase of Ta_xN film transforms from nearly amorphous state to a mixed phase of Ta₂N and Ta, the resistivity (ρ) of Ta_xN film decreases gradually, and the temperature coefficient of resistance (TCR) decreases gradually and tends to be close to zero. The diamond-based Ta_xN thin films with excellent electrical properties and good adhesion can be obtained by the vacuum heat treatment at a heat treatment temperature of 550 ℃.

Key words： diamond tantalum nitride vacuum heat treatment TCR

Published: 10 August 2025 Online: 2025-08-13

CLC number:

TN604

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	Articles by authors
	LI Hao
	LIU Yulun
	LIU Jinlong
	CHEN Liangxian
	LI Chengming
	WEI Junjun

Cite this article:

LI Hao,LIU Yulun,LIU Jinlong, et al. Effect of Vacuum Heat Treatment on Microstructure and Electrical Properties of Diamond-based Ta_xN Thin Films[J]. Materials Reports, 2025, 39(15): 24060003-5.

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https://www.mater-rep.com/EN/10.11896/cldb.24060003 OR https://www.mater-rep.com/EN/Y2025/V39/I15/24060003

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