玻璃微探针电沉积的微结构制造路径规划

doi:10.11896/cldb.23100020

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Abstract In order to achieve rapid and stable planar growth of meniscus confined electrodeposition (MCED) in a two-dimensional planar, an adaptive micro-jump partitioned deposition (AMJPD) method is proposed. This method utilizes scanning electrochemical cell microscopy (SECCM) to obtain the equations of the deposition plane, and combines it with the partitioned scanned deposition path from pre-deposited images to gene-rate a three-dimensional deposition path based on this plane. By introducing the proposed adaptive micro-jump deposition mode, obstacles encountered during planar growth deposition are effectively circumvented, enabling rapid and controllable planar manufacturing at the microscale. Experimental results show that the AMJPD method can be used for the deposition drawing of multiple line segments and planar patterns, achieving stable fabrication of micro lines with a width of 6 μm and an aspect ratio of 17∶1. Therefore, the AMJPD method proposed can be applied to the fabrication of various precision metal microstructures and micro-components, and should be widely used in the future in precision device fabrication, life medicine sensing and other related fields.

Key words： meniscus confined electrodeposition micro-jump deposition mode partition scanning adaptive planes additive manufacturing

Published: 10 March 2025 Online: 2025-03-18

CLC number:

TG156

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	Articles by authors
	XU Haili
	YANG Yawen
	XING Qiang
	CHEN Yan
	LIAO Xiaobo
	ZHANG Xiaoping
	ZHUANG Jian

Cite this article:

XU Haili,YANG Yawen,XING Qiang, et al. Microstructure Fabrication Path Planning for Glass Microprobe Electrodeposition[J]. Materials Reports, 2025, 39(5): 23100020-7.

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https://www.mater-rep.com/EN/10.11896/cldb.23100020 OR https://www.mater-rep.com/EN/Y2025/V39/I5/23100020

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