INORGANIC MATERIALS AND CERAMIC MATRIX COMPOSITES |
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Research Progress of Atomic Layer Deposited Micro-channel Plate |
GUO Junjiang1,2,3,ZHU Xiangping1,2,XU Yantao1,2,CAO Weiwei1,2,3,ZOU Yongxing1,LU Min1,PENG Bo1,SI Jinhai3,GUO Haitao1,
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1 State Key Laboratory of Transient Optics and Photonics,Xi'an Institute of Optics and Precision Mechanics,Chinese Academy of Sciences,Xi'an 710119,China 2 University of Chinese Academy of Sciences,Beijing 100049,China 3 School of Electronic and Information Engineering,Xi'an Jiao Tong University,Xi'an 710049,China |
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Abstract The micro-channel plate (MCP) is the core device for electronic multiplication and signal amplification in the fields of optical communication and optoelectronic technology, and the performance improvement research of MCP is mainly focused on increasing gain, extending service life and reducing dark count. Currently, the commonly used commercial MCPs are still prepared based on the traditional lead silicate glass via hydrogen reduction process. Although its gain, lifetime and dark count can reach 103, 0.3 C/cm2, 0.25 events/(s·cm2), respectively, optimized by four generations of glass components and preparation process, the glass composition and complicated preparation process limit its further enhancement in performance, e.g. lower ion feedback and background noise, and higher gain. In view of this,researchers have proposed and perfected a new solution over the past decade:adopting atomic layer deposition (ALD) techno-logy to deposit functional layers, including the conductive layers and secondary electron emission layers onto the surface of borosilicate glass substrates. Thereby, an MCP with conduction and electron multiplication capability is obtained. This novel ALD-MCP can effectively avoid the restriction of substrate glass on its performance optimization, realize the independent design of the substrate glass and the functional layer’s materials, and significantly improve the comprehensive performance of the MCP. Through continuous attempts, the ALD functional layers exhibiting much superior performance to that of traditional MCP have been developed. The prevailing deposition materials for conductive layer are Al2O3/ZnO, Al2O3/W or Al2O3/Mo , and for the secondary electron emission layers are MgO or Al2O3, with the products' gain elevated to 104, dark count reduced to 0.078 events/(s·cm2), and lifetime prolonged to 7 C/cm2. However, its stability still requires further improvement. In addition, deeper investigations are needed to improve deposition efficiency, and to optimize and regulate the performance of functional layers. This paper provides a systematic summary over the worldwide research status of ALD-MCP from the perspectives of functional layer composition and product performance. Moreover, it also gives a critical discussion involving the problems in current research and a prospective outlook for future development trends.
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Published: 03 January 2020
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Fund:This work was financially supported by the National Key Research and Development Program of China (2016YFB0303804). |
About author:: Junjiang Guo received his B.S. degree in physics from Xinzhou Teachers University in 2009. He is currently pursuing his Ph.D. at the Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Science under the researcher Haitao Guo. His research has focused on atomic layer deposition micro-channel plate;Haitao Guo received his B.S. degree in composite materials and Ph.D. degree in Material Science and Engineering from Wuhan University of Technology in 2002 and 2007, respectively. Now, he is working as a researcher in Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Science. His major research interests are fabrication and analysis of new functional glasses, fibers and optical device, etc. Into the Academy of Sciences, the "Western Light Joint Scho-lars” talent program and the “Youth Innovation Promotion Excellence Talents Program”. He hosted the National Natural Science Foundation, the National key R & D projects, Pre-research key project and the Shaanxi Provincial Natural Science Foundation et. al. Meanwhile, he has published more than 60 articles in the SCI journals such as Optics Express, Journal of the American Ceramic Society, and applied for more than 10 national invention patents. |
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1 Pan J S.Journal of Applied Optics, 2003, 25(5), 5(in Chinese). 潘京生.应用光学, 2003, 25(5), 5. 2 Huang M, Dai L Y.Optoelectronic Technology, 1994, 14(2), 51(in Chinese). 黄敏, 戴丽英. 光电子技术, 1994, 14(2), 51. 3 Yang Y Q. Modern Weapon, 1986(4), 50(in Chinese). 杨玉勤.现代兵器, 1986(4), 50. 4 Fraser G W, Pearson J F, Lees J E, et al. Society of Photo-Optical Instrumentation Engineers,1988, 982, 98. 5 Bruce L, Mark D, Francis L. Society of Photo-Optical Instrumentation Engineers, 1996, 2808, 72. 6 Matsuoka K. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2014, 766, 148. 7 Liu Shulin, Deng Guangxu, Zhang Jisheng, et al.Journal of Applied Optics, 2003(8), 61(in Chinese). 刘术林, 邓广绪, 张继胜, 等.应用光学, 2003(8), 61. 8 Suntola T. USA Patent, EP4058430, 1977. 9 Suntola T. Thin Solid Films, 1992, 216(1), 84. 10 Suntola T. USA Patent, EP4413022, 1983. 11 Horton J R, Elizabeth C, Tasker G W, et al. USA Patent, EP5205902, 1993. 12 Goodman C H L, Pessa M V.Journal of Applied Physics, 1986, 60 (3), R65. 13 George S M, Ott A W, Klaus J W.Journal of Physical Chemistry, 1996, 100, 13121. 14 Wu Y Y, Li B S, Wang C Q.Equioment for Electronic Products Manufacturing, 2005, 34(6), 6(in Chinese). 吴宜勇, 李邦盛, 王春青.电子工业专用设备, 2005, 34(6), 6. 15 Tuomo Suntola. USA Patent, EP4058430, 1977. 16 George S M.Chemical Reviews, 2010, 110, 111. 17 Foroughi-Abari A, Cadien K. Nanofabrication Techniques and Principles, Springer-Werlag Wien Press, New York, 2012. 18 Niinistij L, Leskela M. Thin Solid Films, 1993, 225(1-2), 130. 19 Leskela M, Ritala M. Angewandte Chemie International Edition, 2003, 42 (45), 5548. 20 Marichy C, Bechelany M, Pinna N. Advanced Materials, 2012, 24 (8), 1017. 21 Ofer S, Robert B, Ana R L, et al. Thin Solid Films, 2002, 402, 248. 22 Yuan J P, Li W, Guo W N.Surface Technology, 2010, 39(4), 77(in Chinese). 袁军平, 李卫, 郭文显.表面技术, 2010, 39(4), 77. 23 Johnson R W, Hultqvist A, Bent S F.Materials Today, 2014, 17 (5), 236. 24 Miikkulainen V, LeskeläM, Ritala M, et al. Journal of Applied Physics, 2013, 113 (2), 021301. 25 Fraser G W, Pearson J F, Lees J E.Nuclear Instruments and Methods in Physics Reaearch, 1987, A254, 447. 26 Laprade B N, Reinhart S T, Wheeler M.Proceedings of SPIE, 1990, 1243, 162. 27 Kulov S K, Kesaev S A, Bugulova I R, et al. Proceedings of SPIE, 2005, 5834,1. 28 Lu N H, Yang Y G, Lv J W, et al.Physics Procedia, 2012, 26, 61. 29 Ritala M, Leskela M, Dekker J, et al.Chemical Vapor Deposition, 2015, 5(1), 7. 30 Ritala M, Leskela M. Nanotechnology, 1999, 10(1), 19. 31 Uhm H S, Choi E H, Cho G S. Applied Physics Letters, 2019,94, 031501. 32 Insepov Z, Ivanov V, Frisch H. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2010, B268, 3315. 33 Then A M, Pantano C G.Journal of Non-Crystalline Solids, 1990, 120, 178. 34 Minot M J, Bennis D C, Bond J L.Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2015, A787, 78. 35 Ertley C, Siegmund O H W, Cremer T.Nuclear Instruments and Methods in Physics Research Section A:Accelerators, Spectrometers, Detectors and Associated Equipment, 2017, doi.org/10.1016/j.nima.2017.10.050. 36 Mane A U, Peng Q, Wetstein M J, et al.Proceedings of SPIE, 2011, 8031, 80312H. 37 Ertley C, Siegmund O H W, Schwarz J, et al.Proceedings of SPIE, 2015, 9601, 96010S. 38 Pfaffinger M, Böhm M, Britting A, et al.Nuclear Instruments and Methods in Physics Research Section A:Accelerators, Spectrometers, Detectors and Associated Equipment, 2017, DOI.org/10.1016/j.nima.2017.10.084. 39 Siegmund O H W, McPhate J B, Jenlinsky S R, et al.IEEE Transactions on Nuclear Science, 2013, 60(2), 923. 40 Siegmund O H W, Richner N, Gunjala G, et al. Proceedings of SPIE, 2013, 8859, 88590Y. 41 Minot M J, Adams B W, Aviles M, et al. Proceedings of SPIE, 2016, 9968, 99680X. 42 Beaulieu D R, Gorelikov D, Klotzsch H, et al. Nuclear Instruments and Methods in Physics Research A, 2011, 663, S59. 43 Zhang H, Cui W Z. Space Electronic Technology, 2016(3), 7(in Chinese). 张恒, 崔万照. 空间电子技术, 2016(3), 7. 44 Jokela S J, Veryovkin I V, Zinovev A V, et al. Physics Procedia, 2012, 37, 740. 45 Joy D C.Scanning, 1995, 17, 270. 46 Uhm H S, Choi E H, Cho G S.Applied Physics Letters, 2009, 94, 03151. 47 Conneely T M, Milnes J S, Howorth J. Nuclear Instruments and Methods in Physics Research Section A:Accelerators, Spectrometers, Detectors and Associated Equipment, 2013, A732, 388. 48 Xu T, Li Q, Xu Y L, et al. Proceedings of SPIE, 2018, 10848, 108480H. 49 Elam J W, Routkevitch D, George S M. Journal of the Electrochemical Society, 2003, 150(6), G339. 50 Mane A U, Elam J W.Proceedings of SPIE, 2013, 8818, 88180M. 51 Mane A U, Elam J W.Chemical Vapor Deposition, 2013, 19, 186. 52 Elam J W, Mane A U, Libera J, et al.ECS Transactions, 2013, 58(10), 249. 53 Mane A U, Tong W M, Brodie A D, et al. ECS Transactions, 2014, 64(9), 3. 54 Mane A U, Elam J W, Robert G, et al.Proceedings of SPIE, 2017, 9968, 99680C. 55 Siegmund O H W, Fujiwara K, Hemphill R, et al. Proceedings of SPIE, 2011, 8145, 81450J. 56 Siegmund O.H.W, McPhate J B, Tremsin A S, et al.Nuclear Instruments and Methods in Physics Research Section A:Accelerators, Spectrometers, Detectors and Associated Equipment, 2015, A787, 110. 57 Ertley C, Siegmund O H W, Schwarz J, et al.Proceedings of SPIE, 2015, 9601, 96010S. 58 O'Mahony A, Craven C A, Minot M J, et al.Journal of Vacuum Science & Technology A: Vacuum, Surfaces and Films, 2015, 34(1), 01A128. 59 Cong X Q, Qiu X B, Sun J N, et al.Infrared and Laser Engineering, 2016, 45 (9), 0916002. 60 Huang Y G, Gu Z A, Zhang Y, et al.Journal of the Chinese Ceramic Society, 2012, 40(7), 994. 61 Huang Y G, Zhang Y, Liu H, et al. Proceedings of SPIE, 2011, 8194, 81941Q. 62 Yan B J, Liu S L, Heng Y K.Nanoscale Research Letters, 2015, 10, 162. 63 Yang Y Z, Yan B J, Liu S L, et al.Nuclear Instruments and Methods in Physics Research Section A:Accelerators, Spectrometers, Detectors and Associated Equipment, 2017, 868, 43. |
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