基于嵌段共聚物的硅表面聚合物刷点阵组装

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Abstract Block copolymer nano-etching technology has attracted wide attention in the field of integrated circuit silicon chip and biochip because of its advantages of mass production. We further improved the technique. The self-assembly template of block copolymer was obtained by spin coa-ting, then the corresponding SiH_x nano-pits were fabricated on the silicon surface by wet etching, and further the nano-array structure of polymer brushes was generated. The morphology was imaged by atomic force microscope (AFM), and the surface molecular structure was characterized by multiple transmitter-reflection infrared spectroscopy (MTR-IR) in each step for the whole sequential stepwise reactions. In addition, according to the observed dendritic structure in the AFM images, the growth mechanism of dendritic appearence and diffusion restricted aggregation of polymer brushes was proposed.

Key words： self-assembly of block copolymer wet corrosion SiH_x nanopits dot array of polymer brushes

Published: 05 July 2019

CLC number:

TQ317.9

About author:: Xiaobin Lu received his Ph.D. degree in Chemistry from Nanjing University in 2016. He is currently an associate professor in Qiannan Normal University for Nationalities and participates in the development of interface chemistry technology. His research interests are preparation of polymer brush patterning on silicon surface. He has published more than 10 pieces of articles in important journals at home and abroad and applied for more than 3 invention patents.

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LU Xiaobin. Array Assembly of Polymer Brushes on Silicon Surface Based on Block Copolymer[J]. Materials Reports, 2019, 33(z1): 505-509.

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http://www.mater-rep.com/EN/ OR http://www.mater-rep.com/EN/Y2019/V33/Iz1/505

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