Materials Reports 2021, Vol. 35 Issue (z2): 60-63 |
INORGANIC MATERIALS AND CERAMIC MATRIX COMPOSITES |
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Effect of Work Pressure on Microstructure and Properties of Magnetron Sputtering TaN Coatings |
ZHANG Yubao, LI Zhigang, WANG Yi, JIANG Jicheng, YAO Gang, ZHAO Hongtao
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Heilongjiang Institute of Atomic Energy, Harbin 150086, China |
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Abstract Aseries of TaN films with different working pressures were prepared on Al2O3 ceramic substrate by reactive magnetron sputtering technology. Using X-ray diffractometer (XRD), atomic force microscope (AFM), step profiler, scratch tester and four-probe resistance meter to study the influence of the microstructure, roughness, deposition rate, film-base bonding force and electrical performance of TaN films with different working pressures. The results show that the magnetron sputtering TaN films are mainly fcc δ-TaN crystal structure; when the working pressure is 0.4 Pa, the film-base bonding force and deposition rate of the TaN film are the highest, the conductivity and density are the best, and its bonding force, Deposition rate, square resistance and roughness are 53.2 N, 4.28 nm/min, 45.06 Ω/□ and 1.09 nm, respectively.
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Published: 09 December 2021
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Fund:This work was financially supported by Scientific Research Fund of Heilongjiang Academy of Sciences (KY2020WL02) and Special Program for Improving Innovation Ability in the Field of Discipline of Heilongjiang Academy of Sciences (XKLY2019WL01-03). |
About author:: Yubao Zhang is an associate professor in Heilongjiang Institute of Atomic Energy, focusing on the research of radiation technology and plasma technology applications. Hongtao Zhao, received his Ph.D. degree from Harbin Institute of Technology in 2010. He is currently a professor in Heilongjiang Institute of Atomic Energy. His research interests are application of nuclear technology. |
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