Email Alert
|
Rss
Home
Contents
Ethics
About MR
Contact us
Online preprint
Online special issues
Current issue
Archives
Ethical guidelines for authors
Ethical guidelines for reviewers
Ethical guidelines for editors
Journal profile
Editorial board
Index-in and rewarded
Author and Reader
Reviewers
Editor login
Author login
Reader login
Author infos
Reviewer registration
Reviewer login
Other articles related with "O484.1":
MA Xinguo, CHENG Zhengwang, WANG Mei, HE Jing, ZOU Wei, DENG Shuiquan
Optimizing Technology of the Preparation of AlN Thin Film by Magnetron Sputtering for Acoustic Resonators
Materials Reports 2023 Vol.37 (11): 21080275-7 [
Abstract
] (
606
) [
PDF
4009 KB] (
992
)
LIU Xincheng, SHAO Haicheng, QIAO Guanjun, LU Haojie, YU Liuxu, ZHANG Xiangzhao, LIU Guiwu
Preparation Process and Performance of Continuous Conductive Au Film on Surface of Al
2
O
3
Ceramic
Materials Reports 2021 Vol.35 (8): 8076-8081 [
Abstract
] (
754
) [
PDF
7695 KB] (
242
)
WANG Qian,GAO Neng,ZHANG Tianyao,YAO Guang,PAN Taisong,GAO Min,LIN Yuan
Flexibilization Strategies of Functional Oxide Thin Film Devices:a Review
Materials Reports 2020 Vol.34 (1): 1014-1021 [
Abstract
] (
1063
) [
PDF
6024 KB] (
950
)
GUO Junjiang,ZHU Xiangping,XU Yantao,CAO Weiwei,ZOU Yongxing,LU Min,PENG Bo,SI Jinhai,GUO Haitao
Research Progress of Atomic Layer Deposited Micro-channel Plate
Materials Reports 2020 Vol.34 (3): 3080-3089 [
Abstract
] (
927
) [
PDF
22163 KB] (
227
)
PENG Zengwei, LIU Baoting
Photoconductivity and Photovoltaic Effect of Epitaxial Mn-doped BiFeO
3
Thin Film Capacitor
Materials Reports 2020 Vol.34 (6): 6010-6014 [
Abstract
] (
639
) [
PDF
3113 KB] (
358
)
跳至
页
第1页
共1页
共5条记录
首页
上一页
下一页
尾页
渝ICP备12006835号-3
渝公网安备50019002502923号
© Editorial Office of Materials Reports.
Address: No.18 Honghu West Rd., Yubei, Chongqing, China Zip Code: 401121
E-mail: editor@mat-rev.com