阴极碳靶电流对物理气相沉积制备ta-C薄膜性能的影响

doi:10.11896/cldb.24030121

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Abstract In this work, tetrahedral amorphous carbon (ta-C) film was deposited on the surface of cemented carbide by changing the cathode carbon target current using a vacuum cathode ion deposition system. By changing the cathode carbon target current (55—95 A), the effect of current on the comprehensive properties of ta-C films was explored. The surface morphology, chemical structure, mechanical properties, and friction properties of ta-C films were analyzed. The results showed that when the cathode carbon target current was 55 A, the surface of the film was the smoothest and densest, the sp³ hybrid bond content was the maximum 63.5%, the friction coefficient was the minimum 0.019 3, and the hardness and elastic modulus were 33.46 GPa and 392.34 GPa respectively. ta-C films with excellent comprehensive properties could be obtained.

Key words： cathode carbon target current ta-C film sp³ hybrid bond content frictional property mechanical property

Published: 25 May 2025 Online: 2025-05-13

CLC number:

TG174

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	Articles by authors
	WEN Xin
	LI Duosheng
	YE Yin
	XU Feng
	LANG Wenchang
	LIU Junhong
	YU Shuangshuang
	YU Xinxiu

Cite this article:

WEN Xin,LI Duosheng,YE Yin, et al. Effect of Cathode Carbon Target Current on Properties of ta-C Thin Films Prepared by Physical Vapor Deposition[J]. Materials Reports, 2025, 39(10): 24030121-5.

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https://www.mater-rep.com/EN/10.11896/cldb.24030121 OR https://www.mater-rep.com/EN/Y2025/V39/I10/24030121

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