工艺参数对等离子增强磁控溅射TiAlN涂层微观结构及性能的影响

doi:10.11896/cldb.21010184

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Abstract In this study, an orthogonal test method was introduced. The wettability of TiAlN coatings deposited by plasma enhanced magnetron sputtering was selected as the experimental indicator. Furthermore, target power, Ar/N₂ flow ratio and negative bias voltage were sensitivity analysis on the indicator. The chemical composition, crystal structure, micro-morphology and surface roughness of TiAlN coatings were characterized using energy dispersive spectrometer (EDS), X-ray diffractometer (XRD), field emission scanning electron microscope (FE-SEM) and atomic force microscope (AFM). The wettability of TiAlN coatings was analyzed with the contact angle. Range analysis shows that the factors with the highest sensitivity to the Al content within the coating are Al target power and Ar/N₂ flow rate ratio, and the highest sensitivity to the grain size, roughness and contact angle of the coating is the negative bias voltage. The coating produced by S2 process shows the best hydrophobic property with contact angle of 120.25°, while the coating prepared by S9 process presents the strongest hydrophilic property with contact angle of 15.15°. This study provides some directions and ideas for an appropriate selection of coating deposition parameters based on engineering applications.

Key words： orthogonal test method plasma-enhanced magnetron sputtering TiAlN coating contact angle

Published: Online: 2023-01-03

CLC number:

TG174.444

Fund:Jing Gang Scholars Programme of Jiangxi Province, National Natural Science Foundation of China(51865015), Science and Technology Research Project of Jiangxi Province Education Department(GJJ190607, GJJ180596), and Doctoral Scientific Research Foundation of Jiangxi Science and Technology Normal University(2020BSQD011).

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	Articles by authors
	ZHANG Yanan
	ZHOU Zichao
	ZHANG Hao
	XIAO Yuqi
	DENG Na
	FU Binyun
	DUO Shuwang

Cite this article:

ZHANG Yanan,ZHOU Zichao,ZHANG Hao, et al. Influence of Deposition Parameters on Microstructure and Properties of Plasma-enhanced, Magnetron-sputtered TiAlN Coatings[J]. Materials Reports, 2022, 36(24): 21010184-6.

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http://www.mater-rep.com/EN/10.11896/cldb.21010184 OR http://www.mater-rep.com/EN/Y2022/V36/I24/21010184

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