粉末靶磁控溅射ZnO/Cu/ZnO的制备及表征

doi:10.11896/cldb.20120259

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Abstract At room temperature, ZnO/Cu/ZnO transparent conductive films were prepared on glass substrate by radio frequency magnetron sputtering of zinc oxide (ZnO) powder and copper (Cu) targets. The effect of the thickness of Cu layer on the photoelectric properties of ZnO/Cu/ZnO thin film were studied. The results showed that the surface of ZnO/Cu/ZnO films were relatively flat and had a good degree of crystallinity; in the visible light range, when the thicknesses of Cu are 11 nm and 14 nm, the achieved highest transmittance of ZnO/Cu/ZnO films were 79% and 74%; when the thickness of Cu is 14 nm, carrier concentration and the motion ability of charged particles are 4.85×10²¹ cm^-3 and 6.73 cm²·V^-1·s^-1 respectively. Compared with ZnO/Ag/ZnO films, ZnO/Cu/ZnO required a thicker copper film to be continuous. ZnO/Ag/ZnO with a thinner Ag layer has better optoelectronic performance than ZnO/Cu/ZnO.

Key words： transparent conductive film powder target RF magnetron sputtering thin-film photovoltaics

Published: 25 March 2022 Online: 2022-03-21

CLC number:	0484.4
	TM24

Fund:National Natural Science Foundation of China (51672119,51972155).

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	LI Tong
	ZHAO Zhuo
	WU Junsheng
	FANG Fang
	ZHOU Yanwen

Cite this article:

LI Tong,ZHAO Zhuo,WU Junsheng, et al. Fabrication and Characterization of the ZnO/Cu/ZnO by Magnetron Sputtering Using Powder Targets[J]. Materials Reports, 2022, 36(6): 20120259-4.

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http://www.mater-rep.com/EN/10.11896/cldb.20120259 OR http://www.mater-rep.com/EN/Y2022/V36/I6/20120259

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