抑制二次电子发射方法的研究

doi:10.11896/cldb.19100163

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Abstract Secondary electron emission (SEE) from dielectric and metal surface can significantly change the potential distribution and flux near the surface. In some cases, the secondary electron production has a positive effect, such as electron beam welder, scanning electron microscope, transmission electron microscope, electron diffractometer, auger electron spectrometer, electron multiplier tube and so on. However, in other cases, secondary electrons are not expected to be excited, such as RF-amplifiers, particle accelerators, hall thrusters, electron vacuum tubes, and on the surface of spacecraft in space. Therefore, the research on reducing secondary electron yield(SEY) is an active research field. The exis-ting research methods include the applied bias field method and the surface treatment method, and the applied electric or magnetic field to suppress the secondary electron will have an adverse effect on the incident beam and beam spot. Therefore, surface treatment method has more advantages, which can be divided into three categories: surface trap structure (rectangular and triangular groove, microporous structure, fiber structure, foam structure, etc.), surface coating (graphene film, TiN film, etc.), and surface beam treatment (laser etching, magnetron sputtering method).The main purpose of these methods of suppressing secondary electrons is either to reduce the emission of true secondary electrons from the surface, to capture the emitted secondary electrons so that they cannot escape, or both. This paper summarizes some methods to suppress the secondary electron and compares the effects of different methods or different factors on the secondary electron.

Key words： secondary electron emission surface structure surface coating ion beam bombardment

Published: 22 April 2021

CLC number:

O53

Fund:National Natural Science Foundation of China (11505123, 11435009)

About author:: Xuelian Jin, who graduated from Nanjing Normal University in June 2017, holds a bachelor's degree in physics and is now a postgraduate student in School of Physical Science and Technology of Soochow Univer-sity, under the guidance of professor Wu Xuemei. Her research focuses on secondary electron emission.
Xuemei Wu, who received the B.Sc. degree in phy-sics from the Shandong University, Shandong, China, in 1988, the M.Sc. degree in Plasma physics from Institute of plasma physics, Chinese Academy of Scie-nces, Hefei, China, in 1991, and the Ph.D. degree in physics from Soochow University, Suzhou, China, in 2002. She has worked in the postdoctoral workstation of the Institute of plasma physics, Chinese Academy of Sciences, Hefei, China, and has been engaged in the research of new plasma source, physicochemical process of plasma discharge and preparation of micro nano materials for a long time. She is now a professor at Soochow University.

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Cite this article:

JIN Xuelian,WU Xuemei,ZHUGE Lanjian, et al. Study on Suppression of Secondary Electron Emission JIN Xuelian^1,2, WU Xuemei^{1,2, ZHUGE Lanjian³, JIN Chenggang⁴[J]. Materials Reports,
2021, 35(7): 7176-7182.}

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http://www.mater-rep.com/EN/10.11896/cldb.19100163 OR http://www.mater-rep.com/EN/Y2021/V35/I7/7176

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