INORGANIC MATERIALS AND CERAMIC MATRIX COMPOSITES |
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Preparation of Graphene by Rapid Electron Beam Annealing Method |
XU Zhuang1, GAO Zhaoshun1,2, HAN Li1, ZUO Tingting1, WU Yue1, XIAO Liye1, KONG Xiangdong1
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1 Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China; 2 Dalian National Laboratory for Clean Energy, Dalian 116000, China |
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Abstract Based on the segregation mechanism of carbon atoms in metal materials, the preparation of graphene by heat treatment of carbon-doped nickel film required a very fast heating and cooling rate. The characteristic of electron beam annealing was that the heating rate was very fast, and the sample could be heated to the required temperature in a short time. Therefore, an electron beam annealing method was proposed to prepare graphene. The nickel film doped with a certain concentration of carbon atoms was heated in the electron beam heat treatment equipment at a certain temperature. When the concentration of carbon atom was 1%, the temperature range of preparing graphene by electron beam annealing method was determined to be 1 000—1 100 ℃, and only 5 s was needed to obtain high-quality graphene with good crystallinity and few defects. The segregation mechanism of carbon atoms in nickel film under the irradiation of electron beam was revealed. The high heating and cooling rate made the residence duration of Ni-C system in Ni-multilayer graphene and Ni-graphite phase interval very short, and the excess carbon atoms on the surface of nickel film were very few, thus forming high-quality single-layer graphene. The method of preparing graphene by electron beam annealing method had the advantages of high efficiency and safety, and improved the application advantages of graphene.
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Published: 12 March 2020
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Fund:This work was financially supported by 100 Talents Program of the Chinese Academy of Sciences. |
About author:: Zhuang Xugraduated from Lanzhou University in June 2017 with a doctorate degree. Since 2017, he has worked in the post-doctoral mobile station of the Institute of Electrical Engineering, Chinese Academy of Scie-nces. His main research direction is the application of electron beam in the field of materials; Zhaoshun Gaois a researcher at the Institute of Electrical Engineering, Chinese Academy of Sciences. He graduated from the Institute of Electrical Engineering of the Chinese Academy of Sciences in 2009 with a PhD in Engineering. He was elected to the "100 Talents Program" of the Chinese Academy of Sciences in 2018. He has been engaged in the research of new electrical materials for a long time. At present, he is mainly committed to improving the conductivity of conventional copper and aluminium through carbon nano-doping and nano-technology. |
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1 Balandin A A, Ghosh S, Bao W, et al. Nano Letters, 2008,8 (3),902. 2 Lee C, Wei X, Kysar J W, et al. Science, 2008,321 (5887),385. 3 Chen J H, Jang C, Xiao S, et al. Nature Nanotechnol, 2008,3 (4),206. 4 Jang B Z, Zhamu A. Journal of Materials Science, 2008,43 (15),5092. 5 Nair R R, Blake P, Grigorenko A N, et al. Science, 2008,320 (5881),1308. 6 Novoselov K S, Geim A K, Morozov S V, et al. Science, 2004,306 (5696),666. 7 Meyer J C, Geim A K, Katsnelson M I, et al. Nature, 2007,446 (7131),60. 8 Green A A, Hersam M C. Journal of Physical Chemistry Letters, 2010,1 (2),544. 9 Hernandez Y, Nicolosi V, Lotya M, et al. Nature Nanotechnology, 2008,3 (9),563. 10 Liang Y T, Mark C H. Journal of the American Chemical Society, 2010,132,17661. 11 Park S, Wang G, Cho B, et al. Nature Nanotechnology, 2012,7 (7),438. 12 Bai H, Li C, Shi G. Advanced Materials, 2011,23 (9),1089. 13 Yan X, Cui X, Li L S. Journal of the American Chemical Society, 2010,132 (17),5944. 14 Somani P R, Somani S P, Umeno M. Chemical Physics Letters, 2006,430 (1-3),56. 15 Kim K S, Zhao Y, Jang H, et al. Nature, 2009,457 (7230),706. 16 Liu N, Fu L, Dai B, et al. Nano Letters, 2011,11 (1),297. 17 Han D, Wang X, Zhao Y, et al. Carbon, 2017,124,105. 18 Yu Q, Lian J, Siriponglert S, et al. Applied Physics Letters, 2008,93 (11),113103. 19 Xu M, Fujita D, Sagisaka K, et al. ACS Nano, 2011,5 (2),1522. 20 Kwak J, Chu J H, Choi J K, et al. Nature Communications, 2012,3,645. 21 Garaj S, Hubbard W, Golovchenko J A. Applied Physics Letters, 2010,97 (18),183103. 22 Malard L, Pimenta M, Dresselhaus G, et al. Physics Reports, 2009,473 (5-6),51. 23 Ferrari A C, Meyer J C, Scardaci V, et al. Physical Review Letters, 2006,97 (18),187401. 24 Ferrari A C, Basko D M. Nature Nanotechnology, 2013,8 (4),235. 25 Liu X, Fu L, Liu N, et al. The Journal of Physical Chemistry C, 2011,115 (24),11976. 26 Cong C, Yu T, Sato K, et al. ACS Nano, 2011,5 (11),8760. 27 Odahara G, Otani S, Oshima C, et al. Surface Science, 2011,605 (11-12),1095. 28 Eckmann A, Felten A, Mishchenko A, et al. Nano Letters, 2012,12 (8),3925. 29 Li X, Cai W, An J, et al. Science, 2009,324 (5932),1312. 30 Ni Z, Chen W, Fan X, et al. Physical Review B, 2008,77 (11),115416. 31 Liu N, Fu L, Dai B, et al. Nano Letters, 2010,11 (1),297. 32 Reina A, Jia X, Ho J, et al. Nano Letters, 2008,9 (1),30. 33 Gupta A, Chen G, Joshi P, et al. Nano Letters,2006,6 (12),2667. 34 Li X, Wang X, Zhang L, et al. Science, 2008,319 (5867),1229. 35 Novoselov K, Jiang D, Schedin F, et al. Proceedings of the National Academy of Sciences, 2005,102 (30),10451. 36 Zhang C H, Fu L, Zhang Y F, et al. Acta Chimica Sinica, 2013,71 (3),308 (in Chinese). 张朝华, 付磊, 张艳峰, 等. 化学学报, 2013,71 (3),308. 37 Fujita D, Homma T. Surface and Interface Analysis, 1992,19 (1-12),430. 38 Seah C M, Vigolo B, Chai S P, et al. RSC Advances, 2016,6 (47),41447. |
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