Abstract: A series of TiN/Ni nanocomposite thin films were deposited on Si (100) and 304 stainless steel substrates at diffe-rent N2 flow rates by reactive magnetron co-sputtering on Ti and Ni targets. The N2 flow rate dependences of the microstructure, adhesion strength and friction coefficient of the deposited films were studied by using atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, field emission scanning electron microscopy and scratch test. The TiN/Ni film has a fine microstructure, a smooth and dense surface, and an fcc structure with a dominant orientation of the (111) plane. The rise of N2 flow rate causes the declines in porosity, grain size and deposition rate, and the biphasic (increase → decrease) changes of both surface roughness and adhesion strength of the resultant composite film. The smallest surface roughness, the highest adhesion strength and the lowest friction coefficient can be achieved by applying a N2 flow rate of 16 mL/min, and their values are 2.75 nm,44.6 N and 0.14, respectively.
贺春林,高建君,王苓飞,马国峰,刘岩,王建明. N2流量对反应共溅射TiN/Ni纳米复合膜结构和结合强度的影响[J]. 《材料导报》期刊社, 2018, 32(12): 2038-2042.
HE Chunlin, GAO Jianjun, WANG Lingfei, MA Guofeng, LIU Yan, WANG Jianming. Effect of N2 Flow Rate on Microstructure and Adhesion Strength of Reactive Magnetron Co-sputtered TiN/Ni Nanocomposite Films. Materials Reports, 2018, 32(12): 2038-2042.
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2018, Vol. 32 
